Microdischarge lamp formation process

摘要: A microdischarge lamp formed in a one piece integral substrate, preferably silicon wafer, via micromachining techniques commonly used integrated circuit manufacture. The is by defining an anode separated from semiconductor cathode, and then hollow cavity penetrating the anode, dielectric cathode. cathode filled with discharge medium sealed to complete formation process. includes micromachined area for enclosing filler, such as mercury vapor. substrate or more regions which act electrodes lamp. light transmissive cap seals area. Selection of particular aperture length ratios permits be operated either positive column discharge. Hollow has been demonstrated at pressures up about 200 Torr. small area, 1 400 micrometers, enable electrons ballistic. In addition, dimensions permit discharges based upon resonance radiation, 253 nm line atomic mercury.