作者: Lena Nicolaides , Prashant Aji , Youxian Wen , Shifang Li , Sven Schwitalla
DOI:
关键词:
摘要: Systems and methods for enhancing inspection sensitivity to detect defects in wafers using an tool are disclosed. A plurality of light emitting diodes illuminate at least a portion wafer capture set grayscale images. residual signal is determined each image the subtracted from set. Defects identified based on Models may be built refined some embodiments disclosed systems methods.