Analysis of titanium coatings deposited and exposed in macrotor and microtor
作者： L. Keller , C.N.J. Wagner , F. Schwirzke , R.J. Taylor
DOI: 10.1016/0022-3115(82)90563-3
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摘要: Abstract Metal coatings of Ti are vapor-deposited (200 A/day) in MACROTOR and MICROTOR during low temperature H2-discharge cleaning operated far away from the gettering threshold for plasma impurity control. Several methods analysis (X-ray diffraction, ESCA, AES, SEM) show that after several months deposition two major effects have an impact on coating: (a) formation a porous microstructure which enhances H2,-gas trapping: (b) Ti-hydride 100 A crystallite size with large microstrain present. Both responsible mechanically chemically unstable first wall. H/D-exchange H-retention affected most by existing wall condition. These difficulties may be avoided using hot (≈400°C) liner.
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