作者: Yoonsu Choi , Kieun Kim , Mark G Allen , None
DOI: 10.1109/MEMSYS.2002.984233
关键词:
摘要: A fabrication approach using SU-8 epoxy photoresist to create three-dimensional structures with continuous variation in the third dimension has been developed. Using this approach, a ramp structure 300 /spl mu/m tall an angle of inclination 36 degrees fabricated. In extension process, both metal and dielectric materials can be deposited patterned on inclined surface. The current application for these is magnetic switches well-defined relative substrate. Such were produced as underlying mechanical support. Switch arrays orientation are able actuate consistently same direction response external fields. Under actuation, switch contact resistance 5.1 Omega/.