Surface damage in TEM thick α-Fe samples by implantation with 150 keV Fe ions
作者： M.J. Aliaga , M.J. Caturla , R. Schäublin
DOI: 10.1016/J.NIMB.2014.11.111
关键词:
摘要: Abstract We have performed molecular dynamics simulations of implantation 150 keV Fe ions in pure bcc Fe. The thickness the simulation box is same order those used situ TEM analysis irradiated materials. assess effect angle and presence front back surfaces. number type defects, ion range, cluster distribution primary damage morphology are studied. Results indicate that, for very thin samples irradiation experiments surfaces affect dramatically produced. At this particular energy, has sufficient energy to both top still leave sample through bottom. This provides new insights on study radiation using situ.
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