作者: P. Schwarz , D. Feili , R. Engel , N. Pagel , H. Seidel
DOI: 10.1016/J.PROENG.2010.09.217
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摘要: Abstract In this work a new concept for the fabrication of silicon based micromechanical squeeze-film sensor has been developed. A thin film gas is trapped between resonator structure and its fixed substrate builds up arrangement. Characteristic parameters, such as resonance frequency, quality-factor phase-shift depend on pressure viscosity thus can be used sensing these properties. First samples with different geometries have fabricated by using combination dry wet etching substrate. Measurement results squeeze effect micro are shown compared theoretical simulations.