Vacuum coating apparatus

作者: Tadao Okimoto , Hiroshi Tamagaki

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摘要: Provided is a vacuum coating apparatus that deposits on substrate, the including: chamber; exhaust unit performs operation inside plurality of rotation holding units hold substrate as subject in rotating state; and revolution mechanism revolves about axis parallel to axes respective units; which are divided into groups so power supplied manner have different potentials. For example, alternately repeat state where become cathodes serve working electrodes play primary role generate glow discharge plasma counter electrodes.

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