作者: S.M. MYERS
DOI: 10.1016/B978-0-12-341818-0.50009-7
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摘要: Publisher Summary This chapter describes ion implantation as a powerful tool for the study of alloying phenomena in metals. It also presents several characteristics and some selected examples use investigating equilibrium alloys. Ion-implanted alloys differ important respects from their thermally prepared counterparts, even at temperatures where system rapidly evolves to collection phases. is this uniqueness that leads new metallurgical information. However, such properties introduce considerations design interpretation experiments. The discusses general features implanted metals bear on These include following: (1) evolution initial state toward thermal equilibrium, (2) precipitation, (3) diffusion time-dependent composition profile. most information about composition-versus-depth profile identities microstructures precipitated Depth profiling may be accomplished number ways; however, backscattering analysis sputter are used frequently. Both methods have sufficient sensitivity depth resolution characterize layers, both widely applicable. Their complementary degree, either more suitable particular purpose.