作者: Doris K. T. Ng , Bipin S. Bhola , Reuben M. Bakker , Seng-Tiong Ho
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摘要: A simple, one step technique for depositing ultrasmooth gold films using pulsed laser deposition is demonstrated by optimizing process parameters. The smoothest film having a root-mean-square roughness of 0.17 nm (including the substrate 0.11 nm) 35 thick on silicon are obtained introducing nitrogen flow in chamber during deposition. We postulate that reduction surface caused gas pressure due to force acting against plasma plume containing Au atoms. acts as filter reduces kinetic energy adatoms. This best result reported so far single gold. It towards low-loss planar plasmon applications.