Atmospheric-pressure plasma processing apparatus for substrates
作者： Wentong Huang , Wenbin Hu
DOI:
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摘要: An Atmospheric-Pressure Plasma processing apparatus used for of substrates, comprises a radio-frequency generator and two electrode plates disposed vertically opposing each other. The have surface to other, one which is flat surface, the other stepped such that gap provided between said comprising narrower part at an upper side wider lower side. connected plates, applies signals so as generate plasma within gap.
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