Width, structure and stability of sheaths in metal plasma immersion ion implantation and deposition: measurements and analytical considerations
作者： André Anders
DOI: 10.1016/S0257-8972(00)01017-3
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摘要: Abstract The size, dynamics, and stability of electric sheaths around substrates immersed in vacuum arc plasmas were investigated using positively biased probes. conditions are applicable to metal plasma immersion ion implantation deposition (MePIIID). It was found that due the high density velocity, sheath is very thin at upstream side substrate. Its thickness scales approximately with 1 mm kV −1 for but data can also be fitted theoretical (bias voltage) 3/4 law. reaches fast (
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