Macro- to nanoscale wear prevention via molecular adsorption.
作者： David B. Asay , Michael T. Dugger , James A. Ohlhausen , Seong H. Kim
DOI: 10.1021/LA702598G
关键词:
摘要: … materials because mature lithographic fabrication techniques are available from the semiconductor industry; 5 however, silicon and its native oxide exhibit high friction and poor wear …
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