Silicon Oxide Surface Chemistry and Nano-Tribology

作者: Seong H. Kim

DOI: 10.1007/978-3-642-03653-8_188

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摘要: As the contact size involved in mechanical device operations decreases, tiie adsorption of gaseous molecules on surface — which normally ignored macroscopic measurements becomes more important and dominant factors governing contract properties such as adhesion friction. Water can causes high severe wear silicon oxide surfaces. In contrast, alcohol vapor from ambient provide unprecedentedly efficient lubrication effects for operation microelectromechanical systems (MEMS) with sliding contacts. Atomic force microscopy (AFM) is an ideal tool studying fiictional behavior nanoscale asperity The tribological response a nanoasperity was studied AFM presence water or vapor. origin adhesion, friction, changes contacts elucidated through vibrational spectroscopic investigation thickness structure adsorbed layers well theoretical calculations their responses.

参考文章(7)
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David B. Asay, Seong H. Kim, Evolution of the Adsorbed Water Layer Structure on Silicon Oxide at Room Temperature Journal of Physical Chemistry B. ,vol. 109, pp. 16760- 16763 ,(2005) , 10.1021/JP053042O
K. Strawhecker, D. B. Asay, J. McKinney, S. H. Kim, Reduction of adhesion and friction of silicon oxide surface in the presence of n-propanol vapor in the gas phase Tribology Letters. ,vol. 19, pp. 17- 21 ,(2005) , 10.1007/S11249-004-4261-2
David B. Asay, Seong H. Kim, Effects of adsorbed water layer structure on adhesion force of silicon oxide nanoasperity contact in humid ambient The Journal of Chemical Physics. ,vol. 124, pp. 174712- 174712 ,(2006) , 10.1063/1.2192510
David B. Asay, Michael T. Dugger, Seong H. Kim, In-situ Vapor-Phase Lubrication of MEMS Tribology Letters. ,vol. 29, pp. 67- 74 ,(2008) , 10.1007/S11249-007-9283-0
David B. Asay, Michael T. Dugger, James A. Ohlhausen, Seong H. Kim, Macro- to nanoscale wear prevention via molecular adsorption. Langmuir. ,vol. 24, pp. 155- 159 ,(2008) , 10.1021/LA702598G