作者: Jun Bo Choi , Kurn Cho , Mi-Hye Lee , Kwang Ho Kim
DOI: 10.1016/S0040-6090(03)01083-6
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摘要: … amount of total Si content in Ti–Si–N film, were … Ti–Si–O at the interface, and the ternary Ti–Si–O layer was segregated into two phases of TiO 2 and SiO 2 . Oxidation resistance of Ti–Si–…