作者: D. Pysch , J. Ziegler , J.-P. Becker , D. Suwito , S. Janz
DOI: 10.1109/PVSC.2009.5411165
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摘要: In this paper the potential of amorphous silicon carbide used as an emitter for heterojunction solar cells is presented. Especially annealing behaviour open-circuit voltage V oc n-doped investigated in detail. We present our results a significant improvement more than 100 mV on both flat and textured front surface triggered by thermal hot plate. The observed can be described best stretched exponential function, which general describes relaxation rates complex systems. Further we optimum conditions post deposition step order to reach highest efficiency. During analysis also deterioration cell performance when structure annealed very long time. conclusion, suppose that diffusion weakly bonded or free hydrogen, activated saturates dangling bonds layer itself most likely important at interface, responsible strong