Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

摘要: We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO 4 laser direct-write patterning indium tin oxide (ITO) thin films then followed by electroforming on patterns. Compared with conventional photolithographic etching technologies, micro-patterns ITO at proper control can achieve high quality surface without requiring numerous steps. Using diffractive multiple beam, film could be removed any damage to glass structure. After patterning, a overlapping area spot was used pattern electrode layer for obtaining fine ablated edge profile. Accordingly, obtained release process via laser-patterned films. The new is maskless, dry low-cost instead complex photolithography, sputtering sacrificial layer.