Patterning of ITO Layer on Glass with High Repetition Rate Picosecond Lasers

摘要: New high repetition rate picosecond lasers offer possibility for efficiency structuring of transparent conductors on glass and other substrates. The results ablation the indium-tin oxide (ITO) layer with at various wavelengths are presented. Laser radiation initiated that formed trenches in ITO. Profile was analyzed a phase contrast optical microscope, stylus type profiler, SEM AFM. Clean removal ITO 266 nm observed when laser fluence above threshold 0.20 J/cm, while 355 higher, 0.46 J/cm. substrate damaged area where higher than 1.55 532 allowed getting well defined trenches, but lot residues form dust were generated surface. Use UV fluences close to made it possible minimize recast ridge formation surface contamination during process. latter confirmed by scanning Auger spectroscopy. processing speed up 0.5 m/s achieved using range.