作者: J.A. Power , D. Barry , A. Mathewson , W.A. Lane
DOI: 10.1016/0167-9317(91)90215-Y
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摘要: Unavoidable statistical perturbations inherent in any IC manufacturing process lead to variations MOSFET device parameters. Circuit performances, being sensitive these model parameters, also exhibit spreads. A new methodology by which circuit designers can accurately predict worst-case performance limits prior fabrication is presented. Measured parameter spreads, correlations, principal component analysis techniques, and gradient information have been utilised.