Experimental verification of a form‐birefringent polarization splitter

摘要: Experimental verification is made of a new polarization splitter which utilizes artificial anisotropic dielectrics. The composed layers periodically laminated SiO2/TiO2 thin films. SiO2 and TiO2 films are alternately deposited by rf sputtering reactive dc sputtering, respectively. thickness each layer 50 nm, while the total number amounts to 2000. measured split angles 5.7° (λ=0.63 μm) 5.1° (λ=1.3 μm), being roughly same as those predicted.