作者: T. Miyajima , H. Okuyama , K. Akimoto , Y. Mori , L. Wei
DOI: 10.1016/0022-0248(92)90838-A
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摘要: Abstract We studied point defects in ZnSe films grown by molecular beam epitaxy using the positron annijilation method. found that doping with Ga atoms induces vacancy type such as Zn-vacancies, and a heavy oxygen interstitial films. think these are one of causes active carrier saturation doped