Effect of sputtering in Xe ion irradiated yttria-stabilized zirconia
作者： I.V Afanasyev-Charkin , K.E Sickafus
DOI: 10.1016/S0022-3115(02)01233-3
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摘要: Abstract Fully stabilized zirconia is known as a radiation resistant material. The objective of many experiments on has been to test the susceptibility this material amorphization. Because exhibits high tolerance, made very fluence ion irradiation necessity and so, additional irradiation-induced effects such surface sputtering become important. In paper, we present results from 340 keV Xe ++ irradiations yttria-stabilized (YSZ) fluences ranging 1×10 15 1.5×10 21 ions/m 2 . No amorphization YSZ was observed after even highest fluence. To assess at fluence, an analytical model developed, using range damage distributions calculated Monte Carlo simulations for ion–solid interactions. Analysis experimental data revealed that fluences, implanted distribution profiles are significantly modified by sputtering.
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