Process for depositing silicon dioxide films
作者： Hirotsugu Nagayama , Akihiro Hishinuma , Hideo Kawahara , Takuji Goda , Yasuto Sakai
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摘要: A process for depositing a silicon dioxide film on the surface of substrate such as alkali-containing glass by bringing into contact with treating solution comprising hydrosilicofluoric acid supersaturated dioxide, which is obtained heating substantially saturated has temperature not more than 0° C., to less 25° C.
lens.org 参考文章(2)
Hirotsugu Nagayama, Hideo Kawahara, Hisao Honda, Method for making a silicon dioxide coating ,(1983)
Frederick H Nicoll, Soren M Thomson, Method of depositing silica films and preparation of solutions therefor ,(1949)