Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
作者： David W. Groechel , John Trow , Eric Askarinam , Kenneth S. Collins , Michael Rice
DOI:
关键词:
摘要: The invention is embodied by a plasma reactor for processing workpiece, including enclosure (105) defining chamber (100), semiconductor window (110), base (120) within the (100) supporting workpiece (125) during thereof, gas inlet system (137) admitting precursor into and an inductive antenna (145) adjacent side of (110) opposite coupling power interior through electrode (110).
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