Projection type exposure apparatus

摘要: A projection type exposure apparatus has a objective lens, negative having predetermined shape pattern and an alignment mark, photosensitive plate mark. The of the is projected upon by lens. Main illuminating optical means illuminates with first wavelength light to which sensitive, second insensitive. positional relation between detected using through One mark on zone forms light-condensing point at position spaced apart amount from surface said one formed, corresponds chromatic aberration side thereof adjacent pattern, for relative light.