作者: D. A. Javernick , G. R. Edwards , P. R. Chidambaram
DOI: 10.1007/S11661-998-0184-0
关键词:
摘要: Chemical vapor deposition (CVD) of titanium onto the surface alumina substrates was used to improve wetting by molten aluminum prior infiltration. The CVD coatings on were characterized X-ray diffraction and energy-dispersive spectroscopy (EDS) as dual-phase, elemental aluminide, Ti3Al. kinetics coating process quantified analyzed using established reaction models. An overall activation energy 219 kJ/mole calculated for formation planar substrates, temperature range 610 °C 870 °C. CVD-coated porous immersed in aluminum, infiltration bodies documented. Formation both aluminum-rich titanium-rich products observed through EDS cross-sectional analysis.