Photodepression in As–S thin films

作者: M. Kasai , H. Nakatsui , Y. Hajimoto

DOI: 10.1063/1.1663754

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摘要: A small depression (about 80 A) was observed when As–S thin films were exposed to a xenon 500‐W lamp. The is considered be structural change in amorphous As–S.

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