Development of the RF plasma source at atmospheric pressure

摘要: Abstract A radio frequency (RF) plasma source operates by feeding helium or argon gas through two coaxial electrodes driven a 13.56 MHz RF source. In order to prevent an arc discharge, dielectric material is loaded outside the center electrode. stable, arc-free discharge produced at flow rate of 1.5 l/min gas. The temperature flame varies from 100 150 °C depending on power. breakdown voltage also changes when varies. generation in hot chamber much more efficient than that cold chamber. characteristics are diagnosed using optical emission spectroscopy. One applications printed circuit board (PCB) cleaning process, needed for environmental protection. PCB device forms asymmetric biaxial reactor.