作者: Miki Niwa , Hisato Funabiki , Nobuaki Kodakari , Naonobu Katada
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摘要: A method for producing a silica mask on metal oxide surface is disclosed. Benzaldehyde adsorbed neutral or weak alkaline surface, and then tetra-methoxy silane deposited. The hydrolyzed by water vapor into the benzaldehyde removed NH3 as benzo-nitrile. Thus produced has vacancies corresponding to benzaldehyde. act adsorption sites shape selective adsorption.