Photoresist having increased sensitivity and use thereof
作者： Karen Elizabeth Petrillo , David Earle Seeger , Edward Darko Babich , John Patrick Simons
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摘要: The sensitivity of a photoresist to actinic light is improved by the addition certain dyes. includes polymer matrix, photosensitive acid generator and at least one compound selected from group consisting dyes containing heterosulphur atom such as 2,21,51,2''-terthiophene its derivatives; thianthrene derivatives, 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic 5,7,12,14-pentacenetetrone. Resist images on substrate are formed compositions.
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