Silicalite-1/polymer films with low-k dielectric constants
作者： O. Larlus , S. Mintova , V. Valtchev , B. Jean , T.H. Metzger
DOI: 10.1016/J.APSUSC.2003.11.062
关键词:
摘要: Abstract Two-component films including nanosized silicalite-1 zeolite and acryl latex were deposited on silicon wafers via spin-coating approach. The first stage of the preparation included spin-on as-synthesized or purified colloidal suspensions (MFI-type topology) nanoparticles with sizes 30 60 nm. After calcination a layer was deposited. porous silicalite-1/polymer have high mechanical stability dielectric constant in range 2.0–2.5. nature, thickness disorientation forming determine them as very promising low materials useful insulating microelectronics.
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