Growth behavior of anodic oxide formed by aluminum anodizing in glutaric and its derivative acid electrolytes
作者： Daiki Nakajima , Tatsuya Kikuchi , Shungo Natsui , Ryosuke O. Suzuki
DOI: 10.1016/J.APSUSC.2014.10.014
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摘要: Abstract The growth behavior of anodic oxide films formed via anodizing in glutaric and its derivative acid solutions was investigated based on the dissociation constants electrolytes. High-purity aluminum foils were anodized glutaric, ketoglutaric, acetonedicarboxylic under various electrochemical conditions. A thin barrier film grew uniformly substrate by anodizing, further caused to breakdown due a high electric field. In contrast, an porous alumina with submicrometer-scale cell diameter successfully ketoglutaric at 293 K. However, increase decrease temperature resulted non-uniform localized pitting corrosion substrate. An could also be fabricated relatively low associated acid. Acid are important factor for fabrication films.
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