Hydrosilylation in semiconductor processing
作者： Gurtej S. Sandhu , Matthew S. Thorum
DOI:
关键词:
摘要: An example of forming semiconductor devices can include a silicon-hydrogen (Si—H) terminated surface on silicon structure that includes patterned features by exposing the to hydrogen fluoride (HF) containing solution and performing modification via hydrosilylation Si—H an alkene and/or alkyne.
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