Plasma treatment apparatus
作者： Toshiyasu Shirasuna , Tatsuyuki Aoike , Yukihiro Abe , Daisuke Tazawa , Kazuto Hosoi
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摘要: In a plasma treatment method of and apparatus for treating the surface target substrate by utilizing glow discharge produced supplying high-frequency power into an inside-evacuated reactor through supply means, plurality impedance regulation means regulating impedances on side are provided correspondingly to reactors, is supplied reactors via corresponding reactors. Plasma can be made in good efficiency low cost having different impedances.
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