摘要: Focused ion beam (FIB) technology has the advantage of being a maskless process compatible with UHV processing. This makes it attractive for use in situ processing and been applied to fabrication various mesoscopic structures. The present paper reviews these results whilst putting emphasis on by combined FIB molecular epitaxy system. typical performance systems is also presented. In order utilize potential advantages processing, reduction damage improvement throughput are important, much effort devoted developing techniques which require reduced dose. importance low-energy discussed.
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