作者: T. Nakano , Y. Nakai , S. Maeda , Y. Umakoshi
DOI: 10.1016/S1359-6454(02)00030-7
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摘要: Abstract Microstructures of duplex-phase C40/C11 b silicides from combinations NbSi 2 , VSi or TiSi with MoSi were investigated focusing on formation and alignment lamellae. The lamellar structure was formed by zone melting subsequent appropriate heat treatment for all combinations, but oriented lamellae obtained only in /MoSi duplex crystals. satisfied the crystallographic relationship (0001) C40 //(110) C11b 1 0 ] //[1 0] //[001] resulting three variants C11 phase two kinds boundary: a type /C11 grain boundary /C40 boundary. Further annealing induced coarsening both phases changed relation due to relaxation misfit strain at boundaries.