Negative electron affinity group III-nitride photocathode demonstrated as a high performance electron source

作者: Francisco Machuca , Zhi Liu , J. R. Maldonado , S. T. Coyle , P. Pianetta

DOI: 10.1116/1.1813453

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摘要: The need for a high performance (low energy spread< 0.5 eV, long lifetime> 3 months per spot, emission stability< 1%∕ h) electron source continues as part of the development of new e-beam writing and inspection tools. We present measurements from a group III-nitride (indium gallium nitride) photocathode in a demountable vacuum system to measure energy spread, lifetime, and preliminary blanking effects. We show the results of cathodes operating in ultrahigh vacuum (UHV), high vacuum (HV), and oxygen-rich backpressures. Our results …

参考文章(4)
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