Resistance associated with FET gate metallization

作者: J. Granlund

DOI: 10.1109/EDL.1980.25269

关键词:

摘要: The resistance of the metallization a FET gate stripe has effect placing non-linear R(I) in series with junction. A simple means calculating is developed, and curve drop across R(1) at milliampere forward biases given.

参考文章(3)
H. Fukui, Determination of the Basic Device Parameters of a GaAs MESFET Bell System Technical Journal. ,vol. 58, pp. 771- 797 ,(1979) , 10.1002/J.1538-7305.1979.TB02244.X
P. Wolf, Microwave properties of Schottky-barrier field-effect transistors Ibm Journal of Research and Development. ,vol. 14, pp. 125- 141 ,(1970) , 10.1147/RD.142.0125
S. Weinreb, Low-Noise Cooled GASFET Amplifiers IEEE Transactions on Microwave Theory and Techniques. ,vol. 28, pp. 1041- 1054 ,(1980) , 10.1109/TMTT.1980.1130223