Measurement of the conduction‐band discontinuity of molecular beam epitaxial grown In0.52Al0.48As/In0.53Ga0.47As, N‐n heterojunction by C‐V profiling

作者: R. People , K. W. Wecht , K. Alavi , A. Y. Cho

DOI: 10.1063/1.94149

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摘要: We report the first measurement of conduction‐band discontinuity ΔEc for molecular beam epitaxial grown N‐n In0.52Al0.48As/In0.53Ga0.47As heterojunction using C‐V profiling technique outlined by Kroemer et al. find ΔEc=(0.50±0.05) eV @297 K corresponding to (71±7)% ΔEg. An interface charge density σi (4.0±0.8)×1011 cm−2 was also obtained. A knowledge is importance quantifying carrier confinement in double heterostructure lasers fabricated from these ternary compounds.

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