Coating solution for low dielectric constant silica based coating film formation and base body with low dielectric constant coating film

摘要: PROBLEM TO BE SOLVED: To obtain a silica based coating film forming solution capable of an insulating having low specific dielectric constant <=3, excellent in adhesion to surface be coated, mechanical strength, chemical resistance and crack by using reaction product fine particle with alkoxy silane and/or halogenated silane. SOLUTION: The contains the expressed formula Xn Si(OR)4-n formula, SiX'4-n or hydrolyzed (in X represents H, F, 1-8C alkyl group, aryl group vinyl R X' halogen atom, (n) integer 0-3). As particle, one obtained hydrolyzing aging after more kinds alkoxyl is preferably used.