Formation of Nickel Oxide Nanotubes with Uniform Wall Thickness by Low‐Temperature Thermal Oxidation Through Understanding the Limiting Effect of Vacancy Diffusion and the Kirkendall Phenomenon

作者: Yi Ren , Wai Kin Chim , Sing Yang Chiam , Jin Quan Huang , Can Pi

DOI: 10.1002/ADFM.201000498

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摘要: In this work, the step-wise oxidation mechanism of nickel (Ni) nanowires is elucidated. Rapid vacancy diffusion plays a significant role at low temperatures in forming heterostructures oxide (NiO) nanotubes with Ni nanowires. Subsequent investigations nanowire higher and faster temperature ramp rates show that it difficult to bypass rapid stage, which affects formation final structure. Therefore, unlikely form solid NiO or uniform wall thickness through conventional annealing/ process Instead, by combining chemical etching step utilized produce for first time from

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