The aging of metallic thin films: Delamination, strain relaxation, and diffusion

作者: M. S. Kennedy , N. R. Moody , D. F. Bahr

DOI: 10.1007/S11837-007-0117-1

关键词:

摘要: The reliability of thin film systems is important to the continued development microelectronics, micro-electromechanical systems, and conventional industries. Most often, devices in these tied ability films remain adhered substrates during component lifetime. This research summary looks at aging gold their subsequent fracture from silicon substrates. mechanical integrity films, controlled by adhesion energy interface, shown be influenced strain relaxation diffusion.

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