作者: G.J. Hughes , P. Ryan , P. Quinn , A.A. Cafolla
DOI: 10.1016/S0042-207X(00)00117-2
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摘要: Abstract The deposition of thin layers manganese and iron on sulphur-terminated InP(100) surfaces has been investigated by soft X-ray core level photoemission. sulphur treatment was carried out in situ using an ultrahigh vacuum compatible electrochemical source. Thin metal were deposited onto the sulphur-induced (2×1) surface reconstruction both n - p -type at room temperature. Fermi position for doping types following anneal found to lie range 1.05–1.15 eV above top valence band. There is evidence a strong chemical interaction between metals which removes moves back towards mid-gap types. Chemically shifted components In 4d P 2P levels diffuse through growing overlayers segregates top.