Simple estimate of electromigration failure in metallic thin films
作者： A. Mogro‐Campero
DOI: 10.1063/1.330531
关键词:
摘要: Electromigration failure in thin metallic films has been studied detail for aluminum and gold. A simple expression is given here, which can be used to provide rough estimates of median time other metals, when experimental information on them not available.
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