Substrate effects on formation and hydrogenation of Mg–Ni films

摘要: Abstract Usually metallic films for metal hydrides research applications are deposited on hard and flat substrates such as silicon, magnesium oxide, fused silica or quartz glass. With the film thickness increases all during hydrogenation deals with typical problems brittleness cracking. In this paper we demonstrate that Mg–Ni hydrogen storage can be successfully to flexible low surface energy expanded PTFE substrates. The received results soft (expanded PTFE) compared being crystalline silicon substrate without plasma pretreatment. It is observed different interface zone between has great affect both crystallinity its reaction hydrogen. also demonstrated modifying of might have microstructure before after hydrogenation.