Electron lithography for the fabrication of microelectronic devices

摘要: Electron lithography is a technique which in widespread use for making masks and reticles the manufacture of integrated circuits. It also commonly used research laboratories exposing micron or sub-micron patterns directly on wafers. In addition, direct exposure used, to limited extent, manufacturing plants, although generally at coarser resolutions. The reasons using electron these applications are explained, history technique's evolution given. two major types instrument-the scanning instrument projection instrument-are described their limitations pointed out. Interactions between electrons with energies tens keV (the typically lithography), substrate (wafer mask plate) resist material (in latent image formed) discussed. shown how interactions affect quality before after development.