作者: Kenji Makihara , Arpad Barna , Mituru Hashimoto , Ji Shi , Susumu Maruyama
DOI: 10.1016/J.TSF.2005.03.028
关键词:
摘要: Abstract A study is made of the epitaxial growth structure a Ni film 123 nm thick on GaAs(001) pre-covered with TiN 3 to 118 in thickness. First, buffer layer prepared GaAs at temperature from 100 700 °C by reactively rf sputtering Ti N 2 gas flowing rate 1 10 sccm. Then deposited fresh between 200 and 500 pure Ar gas. X-ray diffraction transmission electron microscopy are used analyze crystal compositional samples. In our experiments, highly ordered was obtained crystallographic relationship Ni(001)[001] TiN(001)[001] GaAs(001)[001] deposition 1.0 sccm, followed 300 °C, where degree epitaxy depends conclusion, highest grown 13 buffer.