Coating processing apparatus
作者： Yuji Shimomura , Tetsuya Sada , Hiroshi Hashimoto
DOI:
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摘要: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing substrate, spin chuck substrate in cup, lid body and attached to resist solution discharge nozzle discharging onto through of body, small blocking up protrusion member provided underneath surface be positioned inside when into body. Thus, adjustment film thickness after coated can effectively performed.
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