Coating treatment method, computer-readable storage medium, and coating treatment apparatus

作者: Takashi Tanaka

DOI:

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摘要: In the present invention, a substrate is first rotated at rotation speed, and resist solution applied to substrate. Subsequently, of decelerated second speed lower than so that low smooth on The then accelerated third higher solvent for coating and/or dry gas are/is supplied this event, portion thicker set thickness, thinner thickness. This thins thickens uniform solution.

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