The growth behavior and properties of atomic layer deposited zinc oxide films using hydrogen peroxide (H2O2) and ozone (O3) oxidants

作者: J. Park , Tae-Hoon Jung , Jung-Hoon Lee , Hyun-Suk Kim , Jin-Seong Park

DOI: 10.1016/J.CERAMINT.2014.09.133

关键词:

摘要: … , where the oxidation of the zinc precursors occurs faster at … to have them react effectively with the zinc precursors [17]. The … decreased adsorption of the zinc precursor molecules, thus …

参考文章(30)
E.-L. Lakomaa, S. Haukka, T. Suntola, Atomic layer growth of TiO2 on silica Applied Surface Science. pp. 742- 748 ,(1992) , 10.1016/0169-4332(92)90506-S
Yumi Kawamura, Nozomu Hattori, Naomasa Miyatake, Yukiharu Uraoka, Comparison between ZnO films grown by plasma-assisted atomic layer deposition using H2O plasma and O2 plasma as oxidant Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 31, pp. 01A142- ,(2013) , 10.1116/1.4771666
Suvi Haukka, Eeva Liisa Lakomaa, Andrew Root, An IR and NMR study of the chemisorption of titanium tetrachloride on silica The Journal of Physical Chemistry. ,vol. 97, pp. 5085- 5094 ,(1993) , 10.1021/J100121A040
Jae Bin Lee, Hyeong Joon Kim, Soo Gil Kim, Cheol Seong Hwang, Seong-Hyeon Hong, Young Hwa Shin, Neung Hun Lee, Deposition of ZnO thin films by magnetron sputtering for a film bulk acoustic resonator Thin Solid Films. ,vol. 435, pp. 179- 185 ,(2003) , 10.1016/S0040-6090(03)00347-X
E Guziewicz, M Godlewski, L Wachnicki, T A Krajewski, G Luka, S Gieraltowska, R Jakiela, A Stonert, W Lisowski, M Krawczyk, J W Sobczak, A Jablonski, ALD grown zinc oxide with controllable electrical properties Semiconductor Science and Technology. ,vol. 27, pp. 074011- ,(2012) , 10.1088/0268-1242/27/7/074011
F. Paraguay D., W. Estrada L., D.R. Acosta N., E. Andrade, M. Miki-Yoshida, Growth, structure and optical characterization of high quality ZnO thin films obtained by spray pyrolysis Thin Solid Films. ,vol. 350, pp. 192- 202 ,(1999) , 10.1016/S0040-6090(99)00050-4
Joon Seok Park, Wan-Joo Maeng, Hyun-Suk Kim, Jin-Seong Park, Review of recent developments in amorphous oxide semiconductor thin-film transistor devices Thin Solid Films. ,vol. 520, pp. 1679- 1693 ,(2012) , 10.1016/J.TSF.2011.07.018
M. Leskelä, M. Ritala, Atomic Layer Epitaxy in Deposition of Various Oxide and Nitride Thin Films Journal De Physique Iv. ,vol. 05, ,(1995) , 10.1051/JPHYSCOL:19955111
Masashi Ohyama, Hiromitsu Kouzuka, Toshinobu Yoko, Sol-gel preparation of ZnO films with extremely preferred orientation along (002) plane from zinc acetate solution Thin Solid Films. ,vol. 306, pp. 78- 85 ,(1997) , 10.1016/S0040-6090(97)00231-9