作者: Fernand Van de Wiele , Vincent Bayot , Jean-Pierre Colinge , Xavier Baie , Xiaohui Tang
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摘要: Flash memories have the advantages of high access speed and low poser dissipation. With improvement fabrication technologies, floating gates been reduced to nanometer scale in several groups. In this paper, we report on a new process fabricate SOI nano flash memory device, as well characterization self-consistent simulation device operation.